Mini-PLD

Pulsed Laser Deposition

Mini-PLD (Pulsed Laser Deposition) system for fast deposition and subliming materials. The self-built optical heater using a simple bulb allows substrate temperatures above 700° C.

Device Specifications

Number of PLD targets	1
Substrate size	up to 10x10 mm²
Temperature range	25-700 °C
Process gases	Ar₂, O₂
Laser	KrF excimer laser at 248 nm, 750 mJ