Pulsed Laser Deposition

Mini-PLD (Pulsed Laser Deposition) system for fast deposition and subliming materials. The self-built optical heater using a simple bulb allows substrate temperatures above 700° C.

Device Specifications

Number of PLD targets 1
Substrate size up to 10x10 mm²
Temperature range 25-700 °C
Process gases Ar2, O2
Laser KrF excimer laser at 248 nm, 750 mJ